Semicera Semiconductor Technology Co., Ltd., based in Ningbo, Zhejiang Province, China, was established in January 2018. Our mission is to shape the future through materials, and our vision is to become a leading new materials company with core technologies in the semiconductor field. We specialize in the research and development of advanced technologies such as SiC coatings, Tac coatings, pyrolytic carbon coatings, CVD SiC (Solid SiC), and recrystallized silicon carbide, which are critical for the semiconductor industry. We also focus on the large-scale production of high-purity material products.

Honor and Certification

Facilities and Laboratories


CVD high temperature furnace

Coating substrates for LED chip epitaxy, silicon wafer epitaxy, third-generation semiconductor epitaxy substrates and components, TaC coatings, and more.

Vacuum purification furnace

Purification of carbon-based elements such asgraphite, carbon felt, graphite powder, and carboncomposite.

Horizontal graphitization furnace

Primarily employed for high-temperature treatment of carbon materials, such as sintering and graphitization of carbon materials, graphitization of PI film, sintering of thermal conductive materials, sintering and graphitization of carbon fiber ropes, graphitization of carbon fiber filaments, purification of graphite powder, and other materials suitable for carbon environment graphitization.

CNC machines

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Testing equipment

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Four-Probe Instrument

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Coating Material Development and Verrification Equipment

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CTE Test Instrument

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An Introduction to Semiconductor Chip Epitaxy Industrial Chain


IC Chip Epitaxy

Third Generation Semiconductor