SiN Substrate

Overview

Silicon nitride (SiN) substrates are high-performance ceramic wafers valued for their outstanding mechanical strength, thermal stability, and electrical insulation. They are widely used in power electronics, RF and microwave devices, optoelectronics, and advanced packaging. Standard sizes are stocked for fast turnaround, and every parameter — diameter, thickness, crystal orientation, and surface finish — can be tailored to a customer's process requirements.

Why Silicon Nitride

Specifications

Parameter

Standard Spec

Custom Range

Wafer Diameter

2" / 4" / 6"

1" - 8", custom shapes available

Thickness

0.3 mm / 0.5 mm / 1.0 mm

0.1 - 2 mm

Surface Roughness (Ra)

< 1 nm (polished grade)

Polished / lapped / double-side polished, to spec

Crystal Structure

Single crystal / Polycrystalline

Available on request

Purity

≥ 99.9%

Higher purity grades available

Thermal Conductivity

High (process-dependent)

—

Volume Resistivity

> 10^14 Ω·cm

—

Dimensional Tolerance

± 0.1 mm

Tighter tolerances available

Applications

Custom Capabilities

 

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