MOCVD epitaxial parts
Semicera provides customized MOCVD epitaxial parts for compound semiconductor epitaxial growth systems and high-temperature process equipment. Its product range includes SiC-coated graphite wafer susceptors, multi-pocket carriers, satellite (planetary) susceptors, process trays, and heater assemblies tailored to the specific structural design and operating conditions of the customer's MOCVD reactor.
Depending on the specific reactor design and process environment, MOCVD susceptors may require controlled thermal uniformity, dimensional accuracy, surface stability, and compatibility with high-temperature compound semiconductor fabrication processes. Semicera can support the evaluation of material selection, pocket layout, fabrication requirements, and coating treatment schemes based on customer-provided drawings, STEP files, reactor model, or samples.
Product line
This category encompasses MOCVD epitaxial parts customized to meet the diverse requirements of various reactor platforms and wafer fabrication processes. (Insert URL for each product)
|
Product type |
Major function |
Typical Applications |
|
Multi-pocket wafer susceptor |
Flat graphite disc with multiple wafer pockets (e.g., 6 / 8 / 19 / 36 / 41-piece layouts) |
High-throughput batch epitaxial growth |
|
SiC coated graphite wafer carrier |
Graphite-based structure with a CVD SiC-coated surface |
Wafer processing and epitaxial fabrication processes |
|
Satellite (star-shaped) planetary susceptor |
Rotating carrier with cut-out sections designed for planetary reactor chambers |
GaN and LED epitaxial growth |
|
Single / large-wafer susceptor |
Customized single-pocket or 3-pocket design for large-diameter wafers |
VEECO and other large-wafer MOCVD equipment |
|
SiC coated process disc / tray |
Smooth or grooved disc without wafer pockets, used for chamber conditioning |
Process matching and anti-oxidation protection |
|
Deep UV / LED epitaxy susceptor |
Customized pocket geometry optimized for LED and deep UV LED processes |
Blue/Green LED and deep UV LED epitaxial production |
|
Custom MOCVD susceptor / heater assembly |
Manufactured according to drawings, STEP files, or samples, including heater/coil structures |
OEM replacement parts and equipment development |
Core Technology Considerations
MOCVD epitaxial parts are typically customized based on equipment configuration, wafer size, and process conditions. During technical consultations, the following parameters can be evaluated.
|
Parameter |
Customization Scope |
|
Base material |
Graphite, SiC coated graphite, and monolithic silicon carbide selected according to application requirements |
|
Surface preparation |
CVD silicon carbide coatings and customized anti-oxidation surface treatment solutions provided where applicable |
|
Wafer Compatibility |
Customized based on wafer diameter (2" / 3" / 4" / 6" / 8") and reactor design |
|
Pocket / modular configuration |
Single-wafer, multi-pocket (3 / 6 / 8 / 19 / 36 / 41), satellite/star layout, or smooth process disc |
|
Key Dimensions |
Control based on customer drawings and specified tolerances |
|
Surface Requirements |
Customized according to reactor loading and assembly requirements |
|
Order quantity |
Prototype evaluation, sample production, and batch delivery |
Note: The final technical specifications shall be confirmed in accordance with the customer's drawings, equipment model, operating temperature, process atmosphere, and actual process requirements.
Typical Applications
- • MOCVD Epitaxial Growth System: A component used for wafer support, positioning, and rotation during compound semiconductor epitaxial growth.
- • GaN epitaxial growth: Customized susceptors suitable for GaN-on-Si and GaN-on-Sapphire equipment where high thermal uniformity and consistent surface quality are required.
- • LED and deep UV LED epitaxy: Pocketed susceptors and process trays for Blue/Green LED and deep UV LED epitaxial production.
- • VEECO and other MOCVD platforms: Susceptors and carriers engineered to fit VEECO, AIXTRON, and other mainstream reactor chamber designs.
- • Semiconductor equipment OEM manufacturers: Custom replacement parts and development components manufactured based on engineering evaluation results, technical drawings, STEP files, or as-built samples.
Customized manufacturing processes
Semicera supports a structured custom manufacturing process for MOCVD epitaxial parts:
1. Customer drawings / STEP files / Sample
2. Technology and Materials Assessment
3. Key Dimension and Structural Verification
4. Prototype Manufacturing
5. Precision Machining
6. Surface treatment or CVD silicon carbide coating
7. Inspection and Quality Verification
8. Sample Approval
9. Mass Production
Why choose Semicera?
- • Integrated Material Capability
Semicera's material and component portfolio encompasses silicon carbide coatings, graphite components, silicon carbide ceramic products, quartz materials, carbon fiber materials, and semiconductor wafer products. This portfolio supports cross-material evaluation in MOCVD equipment applications.
- • Original OEM manufacturing and custom production
Customized manufacturing can be assessed based on drawings, STEP files, samples, or specified critical dimensions provided by the customer; for products with non-standard dimensions or complex geometries, a review may be conducted prior to commencing production.
- • From prototype to mass production support
This production process can support sample development and technical validation prior to subsequent batch production; however, it is contingent upon product feasibility and confirmed specification parameters.
Frequently Asked Questions
Q: Can MOCVD epitaxial parts be manufactured according to the drawings provided by the customer?
Yes. Semicera can evaluate two-dimensional drawings, three-dimensional models, and STEP files. Before production, it is essential to verify the material selection, critical dimensions, and surface requirements.
Q: Can existing susceptor or carrier components be replicated?
A: For applicable application scenarios, samples can be measured and subjected to customized processing evaluation; final feasibility depends on the material, structural complexity, and required tolerances.
Q: Can silicon carbide coating be applied to graphite susceptors and carriers?
A: A suitability assessment can be conducted for graphite components coated with CVD silicon carbide, based on the expected MOCVD process environment and technical requirements.
Q: What information do I need to provide to get a quote?
A: We recommend providing drawings or STEP files, material specifications, coating requirements, key dimensions, reactor model, operating conditions, and estimated quantity.
Request for Quotation and Technical Assessment
To obtain a quotation for MOCVD epitaxial parts, please provide your drawings, STEP files, or sample information. Semicera can assess the component structure, material requirements, key dimensions, and manufacturing processes before proceeding with prototyping or mass production.
Please contact Semicera to discuss your specific requirements for customized MOCVD epitaxial parts.
