SiC Epitaxy

Short Description:

Semicera offers custom thin film (silicon carbide)SiC epitaxy on substrates for the development of silicon carbide devices. Weitai is committed to providing quality products and competitive prices, and we look forward to being your long-term partner in China.

 

Product Detail

Product Tags

SiC epitaxy (2)(1)

Product Description

4h-n 4inch 6inch dia100mm sic seed wafer 1mm thickness for ingot growth

Customzied size/2inch/3inch/4inch/6inch 6H-N/4H-SEMI/ 4H-N SIC ingots/High purity 4H-N 4inch 6inch dia 150mm silicon carbide single crystal (sic) substrates wafersS/ Customzied as-cut sic wafersProduction 4inch grade 4H-N 1.5mm SIC Wafers for seed crystal

About Silicon Carbide (SiC)Crystal  

Silicon carbide (SiC), also known as carborundum, is a semiconductor containing silicon and carbon with chemical formula SiC. SiC is used in semiconductor electronics devices that operate at high temperatures or high voltages, or both.SiC is also one of the important LED components, it is a popular substrate for growing GaN devices, and it also serves as a heat spreader in high-power LEDs.

Description

Property

4H-SiC, Single Crystal

6H-SiC, Single Crystal

Lattice Parameters

a=3.076 Å c=10.053 Å

a=3.073 Å c=15.117 Å

Stacking Sequence

ABCB

ABCACB

Mohs Hardness

≈9.2

≈9.2

Density

3.21 g/cm3

3.21 g/cm3

Therm. Expansion Coefficient

4-5×10-6/K

4-5×10-6/K

Refraction Index @750nm

no = 2.61
ne = 2.66

no = 2.60
ne = 2.65

Dielectric Constant

c~9.66

c~9.66

Thermal Conductivity (N-type, 0.02 ohm.cm)

a~4.2 W/cm·K@298K
c~3.7 W/cm·K@298K

 

Thermal Conductivity (Semi-insulating)

a~4.9 W/cm·K@298K
c~3.9 W/cm·K@298K

a~4.6 W/cm·K@298K
c~3.2 W/cm·K@298K

Band-gap

3.23 eV

3.02 eV

Break-Down Electrical Field

3-5×106V/cm

3-5×106V/cm

Saturation Drift Velocity

2.0×105m/s

2.0×105m/s

SiC wafers

Semicera Work place Semicera work place 2 Equipment machine CNN processing, chemical cleaning, CVD coating Our service


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