Product Overview
Semicera manufactures CVD SiC coated graphite pins for wafer handling, positioning, support and other high-temperature semiconductor process applications. The product combines precision-machined graphite with a dense CVD silicon carbide coating. For hollow pins, Semicera also provides a dedicated internal-bore coating process, helping maintain coating coverage while controlling critical dimensions.
Key Features
- Precision dimensional control: coating thickness and substrate geometry are considered together to meet customer drawing requirements.
- Internal bore SiC coating: a dedicated process is available for hollow graphite pins with small or deep internal bores.
- High-purity CVD SiC surface: provides a protective barrier against high-temperature and reactive process environments.
- Customized geometry: outer diameter, inner diameter, length, bore depth, coating thickness and surface finish can be specified to the application.
Technical Specifications
|
Parameter |
Specification |
|
Substrate |
High-purity graphite |
|
Coating |
CVD Silicon Carbide |
|
Structure |
Solid / Hollow / Custom |
|
Internal bore coating |
Available |
|
Dimensions |
Customized according to drawing |
|
Tolerance |
Controlled according to application requirements |
|
Coating thickness |
Customized |
|
Inspection |
Dimensional and coating inspection |
Why Semicera
The performance of a coated graphite pin depends on more than the coating itself. Semicera integrates graphite machining, CVD SiC deposition and final dimensional inspection in one manufacturing route. For hollow pins, the internal bore is treated as a dedicated coating surface rather than an afterthought. This approach supports tight dimensional requirements and customized internal coating specifications.
Typical process: Drawing review → graphite machining → surface preparation → CVD SiC coating → internal bore coating → final inspection → cleaning & packaging.
Applications
CVD SiC coated graphite pins can be customized for:
- · Wafer handling systems
- · CVD/MOCVD equipment
- · Epitaxial processing
- · Semiconductor process chambers
- · R&D equipment.
